|本期目录/Table of Contents|

[1]汪建华,胡晖,翁俊.微波法金刚石膜的均匀沉积[J].武汉工程大学学报,2014,(06):14-19.[doi:103969/jissn16742869201406004]
　WANG Jian hua,HU Hui,WENG Jun.Uniform deposition of diamond films by microwave[J].Journal of Wuhan Institute of Technology,2014,(06):14-19.[doi:103969/jissn16742869201406004]
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微波法金刚石膜的均匀沉积(/HTML)
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《武汉工程大学学报》[ISSN:1674-2869/CN:42-1779/TQ]

卷:
期数:
2014年06期
页码:
14-19
栏目:
材料科学与工程
出版日期:
2014-06-30

文章信息/Info

Title:
Uniform deposition of diamond films by microwave
文章编号:
16742869(2014)06001406
作者:
汪建华1; 2; 胡晖1; 2; 翁俊3
1.武汉工程大学材料科学与工程学院，湖北 武汉 430074;2.等离子体化学与新材料湖北省重点实验室(武汉工程大学)，湖北 武汉 430074;3．中国科学院等离子体物理研究所，安徽 合肥 230031
Author(s):
WANG Jianhua1; 2; HU Hui1; 2; WENG Jun3
1.School of Material Science and Engineering,Wuhan Institute of Technology,Wuhan 430074,China；2.Hubei Key Laboratory of Plasma Chemistry & Advanced Materials(Wuhan Institute of Technology),Wuhan 430074,China;3.Chinese academy of Sciences Institute of Plasma Physics,Hefei 230031,China
关键词:
化学气相沉积; 均匀性; 金刚石膜
Keywords:
chemical vapor deposition; uniformity; diamond film
分类号:
O484
DOI:
103969/jissn16742869201406004
文献标志码:
A
摘要:
采用微波等离子体化学气相沉积法，以氢气和甲烷为主要反应气源进行了大面积金刚石膜的沉积，研究了基片温度、微波功率和沉积气压对大面积金刚石膜均匀性的影响.采用红外测温仪测量基片不同区域的温度，利用扫描电子显微镜表征金刚石膜不同区域的表面形貌.结果表明：较高的微波功率有利于提高金刚石膜的沉积面积和沉积质量，但随着微波功率的提高，基片温度的均匀性也逐渐降低.在对装置的基片台和天线结构进行优化改进后，获得了均匀性较好的基片温度.在改进后的装置中产生的等离子球状态稳定, 利用合适的工艺参数沉积得到了均匀性较好的大面积金刚石膜.
Abstract:
Large area diamond films were deposited by microwave plasma chemical vapor deposition method with hydrogen and methane as gas source.The influences of substrate temperature,microwave power and deposition pressure on uniformity of large area diamond films were studied.The temperatures of different regions on substrate were observed by infrared radiation thermometer and the surface morphology was characterized by scanning electron microscopy.Results show that higher microwave power is benefit to increase the deposited area and quality of diamond films,but substrate temperature uniformity decreases with microwave power increasing.The better uniformity of substrate temperature is obtained after improving the substrate holder and structure of the antenna.The plasma ball is stable in the improved apparatus,finally the large area uniform diamond films are obtained with appropriate parameters.

参考文献/References:

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备注/Memo

备注/Memo:
收稿日期：20140422基金项目：国家自然科学基金项目（11175137）作者简介：汪建华（1955），男，湖北武汉人，教授，博士，博士研究生导师.研究方向：低温等离子.
更新日期/Last Update: 2014-07-29