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[1]马志斌,吴建鹏,湛玉龙,等.氢等离子体处理金刚石成核面[J].武汉工程大学学报,2012,(7):33-36.[doi:103969/jissn16742869201207007]
　MA Zhi\|bin,WU Jian\|peng,ZHAN Yu\|long,et al.Treating nucleation surface of diamond thick film with hydrogen plasma[J].Journal of Wuhan Institute of Technology,2012,(7):33-36.[doi:103969/jissn16742869201207007]
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《武汉工程大学学报》[ISSN:1674-2869/CN:42-1779/TQ]

卷:
期数:
2012年7期
页码:
33-36
栏目:
资源与土木工程
出版日期:
2012-07-30

文章信息/Info

Title:
Treating nucleation surface of diamond thick film
with hydrogen plasma
文章编号:
16742869(2012)07003304
作者:
马志斌; 吴建鹏; 湛玉龙; 曹为; 李国伟; 潘鑫
武汉工程大学材料科学与工程学院，湖北省等离子体化学与新材料重点实验室，湖北 武汉 430074
Author(s):
MA Zhi\|bin; WU Jian\|peng; ZHAN Yu\|long; CAO Wei; LI Guo\|wei; PAN Xin
School of Material Science and Engineering,Key Laboratory of Plasma Chemical and
Advanced Materials of Hubei Province,Wuhan Institute of Technology,Wuhan 430074,China
关键词:
氢等离子体; 金刚石厚膜; 化合态
Keywords:
hydrogen plasma;  diamond thick film;  combination state
分类号:
TQ164
DOI:
103969/jissn16742869201207007
文献标志码:
A
摘要:
通过用氢等离子体对微波等离子体化学气象沉积法在钼基体上制备的金刚石厚膜的成核面进行表面处理，并利用拉曼光谱、扫描电镜和X射线光电子能谱对处理前后金刚石成核面进行表征，比较了处理前后金刚石成核面金刚石相含量、表面粗糙组度，并分析了薄膜中钼原子的化合态及百分含量.结果表明：经过氢等离子体处理后的金刚石成核面的金刚石相含量提高，表面粗糙度增大，钼原子的百分含量由1.64%变为0.83%，且能有效还原成核面上钼的氧化物生成碳化钼和碳化二钼.
Abstract:
The nucleation surface of the diamond thick film prepared by microwave plasma chemical vapor deposition (MPCVD) on Mo substrate was treated by hydrogen plasma. In order to compare the diamond content and surface roughness of the nucleation surface and analyze combination state and percentage composition of Mo atom,the diamond thick film was investigated using Raman spectroscopy,scanning electron microscope (SEM) and X-ray photoelectron spectroscopy (XPS).The results show that the diamond content and the roughness of the nucleation surface have increased,the percentage content of Mo atoms decreases from 1.64% to 0.83%,and the oxide of Mo on the nucleation surface can effectively be restored and form MoC and Mo2C.

参考文献/References:

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相似文献/References:

[1]熊军,汪建华*,王传新,等.热丝CVD法制备大面积金刚石厚膜[J].武汉工程大学学报,2008,(01):80.
　XIONG Jun,WANG Jian hua,WANG Chuan xin,et al.Large area diamond thick film deposited by HFCVD[J].Journal of Wuhan Institute of Technology,2008,(7):80.
[2]熊礼威,汪建华*,满卫东,等.基片温度对金刚石厚膜生长的影响[J].武汉工程大学学报,2008,(01):83.
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备注/Memo

备注/Memo:
收稿日期：20120405基金项目：国家自然科学基金项目（10875093）作者简介：马志斌(1968-)，男，湖北京山人,教授，博士,博士生导师.研究方向：低温等离子体技术及其应用.
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